CMOS compatible fabrication methods for submicron josephson junction qubits - Science, Measurement and Technology, IEE Proceedings-

The authors have developed two distinct processes for the fabrication of mesoscopic Josephson junction qubits that are compatible with conventional CMOS processing. These devices, based on superconducting Al/A1203/AI tunnel junctions, are fabricated by electron beam lithography using single-layer and multi-layer resists. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks. It is simpler and more accurate to implement, and avoids the significant areas of redundant metallisation that are an unavoidable by-product of the tri-layer shadow mask method.